Developer Overview
A K₂CO₃ (potassium carbonate)-based D/F developer concentrate.
An excellent developer for fine patterns by reducing Resist-Foot residue and suppressing over-development on
the side-wall area.
Product Name : DC-50
| Item | Details |
|---|---|
| Applicable Process | Pattern / PSR (Photoresist (PR) developing process) |
| Product Form | Liquid |
| Applicable Lines | MLB, FPC, RF-PCB, HDI |
R-COOH +K2CO3 → K+R-COO- + KHCO3
Resist Polymer becomes water soluble by K+ ion ( or Na ion).
Mechanism
| Component | Role |
|---|---|
| Potassium Carbonate | D/F Resist, PSR INK dissolution |
| Other Components | Liquid catalyst, pH adjustment |
Developer Evaluation Results
Performance (Resist Foot)
To minimize DFR Foot during the developing process, a small amount of hardened DFR residue removal component is required.
| Category | Sodium Carbonate | DC-50 |
|---|---|---|
| Image -SEM- |
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K2CO3 Potassium Carbonate Concentration Change
1
2
pH Change by DFR Dissolution Amount
